D2S Overview

D2S is an emerging company providing semiconductor IP and software to maximize existing e-beam technology to reduce mask costs for both low-and high-volume applications. D2S design-for-e-beam (DFEB) mask technology reduces mask write times for high-volume designs with complex and circular features using existing e-beam mask writing equipment. D2S DFEB direct write technology virtually eliminates the costs of masks for low-volume applications and can speed time-to-market by shortening the design-to-lithography process flow.